Monolayer boron nitride film(HBN) on SiO2/Si

Monolayer boron nitride film(HBN) on SiO2/SiProduct Name Name: Monolayer boron nitride filmHBN? span> Product Overview Boron nitride thin film is a two dimensional material composed of alternating boron and nitrogen atoms, with a graphene like honeycomb lattice structure. It inherits the excellent properties of boron nitride bulk materials, including mechanical, electrical, thermal, and optical properties, and due to its unique two dimensional structure, it has more characteristics and wider

Product Name

^{Name: Monolayer boron nitride film（HBNï¼?/span>}

Product Overview

^{Boron nitride thin film is a two-dimensional material composed of alternating boron and nitrogen atoms, with a graphene like honeycomb lattice structure. It inherits the excellent properties of boron nitride bulk materials, including mechanical, electrical, thermal, and optical properties, and due to its unique two-dimensional structure, it has more characteristics and wider application prospects. The CVD method involves introducing a gas or vapor containing boron and nitrogen elements into a reaction chamber, where a chemical reaction occurs on the substrate surface to deposit a boron nitride film. This method can achieve high-density and high-quality film deposition at lower temperatures, and the thickness, crystallinity, and morphology of the film can be controlled by adjusting the reaction conditions.}

^{Technical Parameter}

Basement :SiO2/Si

Grain size: >4 um

^{Product Features}

^{Excellent insulation performance: Boron nitride itself is a good electrical insulator, and the boron nitride film prepared by CVD inherits this characteristic, with a very high electrical resistivity.}

^{Good thermal stability and high thermal conductivity: CVD boron nitride films can maintain stable structure and properties at high temperatures. Has high thermal conductivity, ranging from tens to hundreds of W/(m · K) (specific values may vary depending on factors such as membrane quality and structure). This high thermal conductivity enables it to effectively conduct heat away from the heat source, which is of great value in heat dissipation applications.}

^{Chemical stability: CVD boron nitride film is inert to most chemical substances and is not prone to chemical reactions with acids, bases, organic solvents, etc.}

^{High surface flatness: Boron nitride films prepared by CVD method usually have a relatively smooth and flat surface.}

^{Application Fields}

^{Electronic devices: Boron nitride thin films have good insulation properties and high temperature stability, and can be used for isolation layers and thermal management applications in electronic devices.}

^{Optical devices: Boron nitride thin films have good transparency in the visible and ultraviolet light regions and can be used for optical devices and optical coatings.}

^{Thermal interface materials: Due to their excellent thermal conductivity, boron nitride thin films can be used to prepare thermal interface materials and heat sinks.}

^{Nanomechanical systems: Boron nitride thin films have good mechanical strength and chemical stability, making them suitable for the manufacturing of nanomechanical systems.}

^{Related Information}

^{Please e-mail for the detailed characterization data.}

E-mail:[email protected]